microwave plasma enhanced chemical vapor deposition system
Description:
microwave plasma enhanced chemical vapor deposition system

Keywords:
thin film and coating deposition

Field of Science:
Diagnostic and measurement technologies, New materials for high-tech, Technologies for sustainable development and energy
Technical specification:
plasma source diameter 6", power 6 kW frequeency 2.45 GHz homogeneous deposition area diameter 5 cm
Usage area:
thin film and coating deposition
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