
ICP deep reactive etching system,
Description:
ICP deep reactive etching system,
ICP deep reactive etching system,
Keywords:
deep reactive ion etching, bulkmicrofabrication
Field of Science:
Diagnostic and measurement technologies, New materials for high-tech, Technologies for sustainable development and energy
Diagnostic and measurement technologies, New materials for high-tech, Technologies for sustainable development and energy
Technical specification:
Homogeneous etching area diameter 15 cm
Homogeneous etching area diameter 15 cm
Usage area:
deep reactive ion etching, bulkmicrofabrication
deep reactive ion etching, bulkmicrofabrication