EBL: E-beam lithography
Description:
E-beam lithography is a sophisticated technique used to create extremely fine patterns on substrates by directing a focused beam of electrons onto a resist-coated surface. This technique allows for the precise control of feature sizes down to the nanometer scale, making it essential for fabricating advanced semiconductor devices and nanoscale structures. E-beam lithography is highly valued for its ability to produce custom and complex patterns with high resolution.
Keywords:
nanofabrication, lithography, exposure, e-beam lithography (EBL)
Field of Science:
Technologies for sustainable development and energy, Featured research equipment
Technologies for sustainable development and energy, Featured research equipment