Universal surface analysis system for X-Ray photoelectron spectroscopy, ion scatering spectroscopy, reflection electron energy loss spectroscopy, and angle Resolved XPS (ARXPS)
Description:
Universal surface analysis system for X-Ray photoelectron spectroscopy, ion scatering spectroscopy, reflection electron energy loss spectroscopy, and angle Resolved XPS (ARXPS)

Keywords:
X-Ray photoelectron spectroscopy, ion scatering spectroscopy, electron spectroscopy, reflection electron energy loss spectroscopy, Angle Resolved XPS (ARXPS)

Field of Science:
Diagnostic and measurement technologies, New materials for high-tech, Technologies for sustainable development and energy, Featured research equipment
Technical specification:
Monochromatised X-Ray sorce (Al anaode). Elements detection limits from 0.1% to 5%. Lens-defined area lateral resolution from 20 µm to 900 µm. High-resolution parallel imaging spectra from areas down to ~ 5 µm. Elements detection limits from 0.1% to 5%. Sample heating up to 1000 K, sample cooling down to 77 K; vacuum better then 5*10-10 mB.
Usage area:
Quantitative and qualitative surface analysis using X-Ray photoelectron spectroscopy, ion scattering spectroscopy, reflection electron energy loss spectroscopy, angle Resolved XPS (ARXPS) with Ar ion surface eching/cleaning possibility
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