Description:

The Raith e-Line Plus is an advanced electron beam lithography system designed for high-precision nanofabrication and nanoscale patterning. It features a versatile platform with a high-resolution electron beam column, capable of achieving feature sizes down to the sub-10 nanometer range. The Raith e-Line Plus has a user-friendly interface and comprehensive software suite, facilitating efficient and accurate design-to-device workflows. The system is also capable of scanning electron microscopy (SEM) and surface chemical analysis (EDX) from Be (Z=4) to Am (95).

The system is installed in a class ISO5 cleanroom.

Description:

Tripple quadrupole masss spectrometer can detect compounds present at very low concentrations, therefore it is very suitable for the quantitative analysis, especially of trace compounds. Also it is possible, to obtain molecular fragments of compounds and perform quantitative analysis by fragmentation pattern. This method of analysis is important for determining composition of the product and also for quality control.

Ultra performance liquid chromatography (UPLC) allows separation of the mixtures of compounds of high to medium polarity. UPLC can separate compounds and record MS spectra in the range of 20-4000 m/z. Sensitivity of the instrument depends on the properties of individual compounds, bus in general it is in the pg  mass range.

Using supercritical fluid chromatography it is possible to analyse also non polar compounds, such as lipids, lipid soluble vitamins and pigments.

Description:

3D printer - Alfawise W10

Description:

Induction heater for metal melting

Description:

The polymer electrohydrodynamic processing device is designed to form polymeric (various polymers available) nano / micro structures.

Description:

Rotary evaporators are mainly used in pharmaceutical, chemical and biopharmaceutical industries for efficient and gentle removal of solvents from samples by evaporation, and solvent recovery. Its advantages come from the fact that rotation of the flask artificially increases the surface area of the solvent and effectively suppresses bumping while decreased pressure facilitates rapid solvent removal at low temperatures. Evaporator has automated jacks and advanced temperature control features.

Description:

ICP RIE system PlasmaTherm Apex SLR is used for the reactive ion etching of a variety of materials, most commonly Si/SiO2. It is equipped with fluorine-based gases and a cryo-cooled electrode, which enabled deep reactive ion etching (DRIE) of silicon. ICP RIE systems have two independent RF power supplies: one controls capacitive coupled plasma and the resulting self-bias, whereas the other supplies power to an antenna coil, inducing an inductively coupled plasma. This type of setup decouples the plasma density control (ICP) from the ion energy (CCP), allowing to achieve much higher etch rates without sacrificing selectivity. 

The system is installed in a class ISO5 cleanroom.

Description:

The OAI Hybralign Series 204IR is a mask aligner system used for parallel exposure wafers and wafer chips through a photomask to define microsctructures in UV sensitive resists. It features near-UV and deep-UV operating modes, an IR backside alignment system, and a UV nanoimprint add-on.

The system is installed in a class ISO5 cleanroom.

Description:

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Description:
X-ray diffractometer for powder and layers ADVANCE D 8