The CR-400 handheld chroma meter (color measuring instrument )
Description: |
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High speed scanning acoustic microscope KSI-V8
Description: High speed scanning acoustic microscope KSI-V8 for high-frequency ultrasonic studies in water to investigate the internal structure of various metals and their alloys, carbon and glass-fibre-reinforced composite materials, metal composites, plastics and their alloys, and to search for internal defects. Also for the study of the internal structure of electronic components and biological objects. |
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Laser ellipsometer - Gaertner L115
Description: A laser ellipsometer is a precision optical instrument used to measure the thickness and optical properties of thin films on surfaces. It employs polarized laser light, which reflects off the sample, and analyzes changes in the polarization state to determine parameters such as refractive index and film thickness. This non-destructive technique is widely used in materials science, semiconductor manufacturing, and surface chemistry for characterizing surfaces at the nanometer scale. |
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Fiber optic spectrometer - CMA 012
Description: Transmittance, absorbance and luminescence measurements in UV-VIS spectral range. Liquids can be analyzed in the standard cuvette, hard transparent samples |
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3D printer - Alfawise W10
Description: 3D printer - Alfawise W10 |
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Laser marking system - Reaying RY-F30
Description: Laser marking system |
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Laser power meter - Ophir Nova II
Description: The Nova II is a very versatile and sophisticated handheld laser power/energy meter.
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Spectroscopic ellipsometer - Semilab GES5E
Description: The device is capable of analyzing the optical constants (k(λ), n(λ)) and measuring the thickness of thin layers, both isotropic and anisotropic, on a wide range of substrates, whether transparent or opaque. It is suitable for examining non-transparent materials as well. Additionally, the system supports the evaluation of periodic structures (scatterometry) and can be used to monitor absorption kinetics in liquids. |
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EBL: E-beam lithography tool - Raith e-Line Plus
Description: The Raith e-Line Plus is an advanced electron beam lithography system designed for high-precision nanofabrication and nanoscale patterning. It features a versatile platform with a high-resolution electron beam column, capable of achieving feature sizes down to the sub-10 nanometer range. The Raith e-Line Plus has a user-friendly interface and comprehensive software suite, facilitating efficient and accurate design-to-device workflows. The system is also capable of scanning electron microscopy (SEM) and surface chemical analysis (EDX) from Be (Z=4) to Am (95). The system is installed in a class ISO5 cleanroom. |
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Mask aligner and nanoimprint lithography tool - OAI Hybralign 204IR
Description: The OAI Hybralign Series 204IR is a mask aligner system used for parallel exposure wafers and wafer chips through a photomask to define microsctructures in UV sensitive resists. It features near-UV and deep-UV operating modes, an IR backside alignment system, and a UV nanoimprint add-on. The system is installed in a class ISO5 cleanroom. |
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ICP RIE: Inductively coupled plasma reactive ion etching system - PlasmaTherm Apex SLR
Description: ICP RIE system PlasmaTherm Apex SLR is used for the reactive ion etching of a variety of materials, most commonly Si/SiO2. It is equipped with fluorine-based gases and a cryo-cooled electrode, which enabled deep reactive ion etching (DRIE) of silicon. ICP RIE systems have two independent RF power supplies: one controls capacitive coupled plasma and the resulting self-bias, whereas the other supplies power to an antenna coil, inducing an inductively coupled plasma. This type of setup decouples the plasma density control (ICP) from the ion energy (CCP), allowing to achieve much higher etch rates without sacrificing selectivity. The system is installed in a class ISO5 cleanroom. |
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Analytical Platform for Organic Synthesis Process Evaluation (Shimadzu LCMS-2050)
Description: Chromatography (HPLC) system with a mass spectrometry (MS) detector and elemental analysis |
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Inert Atmosphere Gloveboxes with Integrated Evaporation System
Description:
Equipment for forming the layers, integrated in an inert atmosphere chamber. |
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LuQY Pro; The absolute luminescence quantum yield measurement system
Description: LuQY Pro is a compact, user-friendly, and non-invasive system designed for fast and reliable quantification of Electroluminescence (EL), Photoluminescence Quantum Yield (PLQY), and implied Open-Circuit Voltage (iVOC / Quasi-Fermi Level Splitting – QFLS) in thin film absorbers, such as hybrid halide perovskites, layer stacks, or complete photovoltaic devices under a variety of operating conditions. |
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