EBL: E-beam lithography tool - Raith e-Line Plus
Description:

The Raith e-Line Plus is an advanced electron beam lithography system designed for high-precision nanofabrication and nanoscale patterning. It features a versatile platform with a high-resolution electron beam column, capable of achieving feature sizes down to the sub-10 nanometer range. The Raith e-Line Plus has a user-friendly interface and comprehensive software suite, facilitating efficient and accurate design-to-device workflows. The system is also capable of scanning electron microscopy (SEM) and surface chemical analysis (EDX) from Be (Z=4) to Am (95).

The system is installed in a class ISO5 cleanroom.

Keywords:
imaging, microscopy, scanning electron microscopy (SEM), X-ray energy dispersion spectroscopy (EDX, EDS), nanofabrication, lithography, exposure, e-beam lithography (EBL)

Field of Science:
Technologies for sustainable development and energy, Featured research equipment
Technical specification:
  • Beam energy: 20 eV – 30 keV
  • Beam current: 5 pA – 1.5 nA
  • Writing speed: 0.125 Hz – 20 MHz pixel frequency
  • Stage travel range/sample size: 100 mm (4")
  • Beam size: >1.6 nm @ 20 keV
  • Stitching accuracy: >40 nm (mean+3σ)
Usage area:
holography and lithography, micro- and nanofabrication
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