Mask aligner and nanoimprint lithography tool - OAI Hybralign 204IR
Description:

The OAI Hybralign Series 204IR is a mask aligner system used for parallel exposure wafers and wafer chips through a photomask to define microsctructures in UV sensitive resists. It features near-UV and deep-UV operating modes, an IR backside alignment system, and a UV nanoimprint add-on.

The system is installed in a class ISO5 cleanroom.

Keywords:
nanofabrication, lithography, photolithography, exposure, nanoimprint lithography (NIL)

Field of Science:
Technologies for sustainable development and energy
Technical specification:
  • Soft and hard contact
  • Substrate stage travel:
    • X, Y ±10mm
    • Z 1,500 μm
    • Rotation ±3.5˚
  • Mask sizes: 4", 5"
  • Wavelengths:
    • UV400: 350-450 nm (NUV)
    • UV300: 280-350 nm (NUV)
    • UV250: 240-260 nm (DUV)
  • Lamp power: 500 W
  • Shutter timer:
    • 0.1 - 99.0 s at 0.1 sincrements
    • 1 - 999 s at 1 s increments
Usage area:
holography and lithography, micro- and nanofabrication
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