Description:

The Raith e-Line Plus is an advanced electron beam lithography system designed for high-precision nanofabrication and nanoscale patterning. It features a versatile platform with a high-resolution electron beam column, capable of achieving feature sizes down to the sub-10 nanometer range. The Raith e-Line Plus has a user-friendly interface and comprehensive software suite, facilitating efficient and accurate design-to-device workflows. The system is also capable of scanning electron microscopy (SEM) and surface chemical analysis (EDX) from Be (Z=4) to Am (95).

The system is installed in a class ISO5 cleanroom.

Description:

Transmittance, absorbance and luminescence measurements in UV-VIS spectral range. Liquids can be analyzed in the standard cuvette, hard transparent samples

Description:

3D printer - Alfawise W10

Description:

Laser marking system

Description:

Induction heater for metal melting

Description:

Salt (fog) spray corrosion test chamber can be used for all kinds of material surface treatment, including coating, electroplating, organic and inorganic coating, anodizing, rust proof oil and preservative treatment test of its corrosion resistance, so as to establish the quality of the products.

Description:

Centrifuge 

Description:

Vacuum drying oven For sample drying or storing at specific conditions 

Description:

Rotary evaporators are mainly used in pharmaceutical, chemical and biopharmaceutical industries for efficient and gentle removal of solvents from samples by evaporation, and solvent recovery. Its advantages come from the fact that rotation of the flask artificially increases the surface area of the solvent and effectively suppresses bumping while decreased pressure facilitates rapid solvent removal at low temperatures. Evaporator has automated jacks and advanced temperature control features.

Description:

Device is feasible to analyse optical constants (k(λ), n(λ)), thickness of thin isotropic and anisotropic transparent and non-transparent layers on isotropic and anisotropic transparent and non-transparent substrates. It can be also used for evaluations of periodical structures (scatterometry) and absorption kinetics in liquids.

Description:

Optical microscope - Nikon Eclipse LV150N is a metallurgical microscope used for surface imaging. It operates in epi-illumination regime and has both bright field and dark field modes. Output can be switched between 10x oculars and a CCD camera. Polarizers are available for polarization contrast imaging.

The system is installed in a class ISO5 cleanroom.

Description:

Vacuum evaporation tool CUBIVAP is used for deposition of Ag thin films by resistive evaporation.

The system is installed in a class ISO5 cleanroom.

Description:

ICP RIE system PlasmaTherm Apex SLR is used for the reactive ion etching of a variety of materials, most commonly Si/SiO2. It is equipped with fluorine-based gases and a cryo-cooled electrode, which enabled deep reactive ion etching (DRIE) of silicon. ICP RIE systems have two independent RF power supplies: one controls capacitive coupled plasma and the resulting self-bias, whereas the other supplies power to an antenna coil, inducing an inductively coupled plasma. This type of setup decouples the plasma density control (ICP) from the ion energy (CCP), allowing to achieve much higher etch rates without sacrificing selectivity. 

The system is installed in a class ISO5 cleanroom.

Description:

The OAI Hybralign Series 204IR is a mask aligner system used for parallel exposure wafers and wafer chips through a photomask to define microsctructures in UV sensitive resists. It features near-UV and deep-UV operating modes, an IR backside alignment system, and a UV nanoimprint add-on.

The system is installed in a class ISO5 cleanroom.

Description:

-

Description:

A laser ellipsometer is a precision optical instrument used to measure the thickness and optical properties of thin films on surfaces. It employs polarized laser light, which reflects off the sample, and analyzes changes in the polarization state to determine parameters such as refractive index and film thickness. This non-destructive technique is widely used in materials science, semiconductor manufacturing, and surface chemistry for characterizing surfaces at the nanometer scale.

Description:
X-ray diffractometer for powder and layers ADVANCE D 8