RIE/PECVD: Reactive ion etching and plasma enhanced chemical vapor deposition system - PlasmaTherm PK-2430
Description:

RF reactive ion etching system

Keywords:
reactive ion etching, surface microfabrication

Field of Science:
Diagnostic and measurement technologies, New materials for high-tech, Technologies for sustainable development and energy
Technical specification:

power 3kW, homogeneous etching area diamater 15 cm

Usage area:
thin film deposition and coating, micro- and nanofabrication
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