The Universal Optical Spectroscopy and Laser Microfabrication System combines advanced laser microfabrication capabilities with precise optical spectroscopy, making it suitable for a wide range of applications. It uses an ultrafast Yb:KGW laser to enable precise material processing at various wavelengths, including its harmonics, and can handle large sample areas with high positioning accuracy. Additionally, the system offers exceptional control over fabrication patterns and supports detailed spectroscopic analysis across a broad spectral range, making it ideal for both cutting-edge research and industrial microfabrication tasks.
Keywords:
Femtosecond laser, ultra fast laser, laser microfabrication, micromachining, ablation, laser drilling, laser marking, laser engraving, galvoscanner, second harmonic, third harmonic, direct ablation with interference field, holographic lithography, 515, 315, 1030, kinetic spectroscopy, pump-probe spectroscopy, differential absorption spectrometer, differential absorption, ultra fast spectroscopy
Diagnostic and measurement technologies, New materials for high-tech, Technologies for sustainable development and energy
- Laser Source: Yb:KGW
- Fundamental wavelength: 1030 nm
- Power: 4 W
- Pulse Duration: >290 fs
- Energy: <0.2 mJ
- Laser microfabrication:
- Harmonic Options for Fabrication:
- First Harmonic: 1030 nm
- Second Harmonic: 515 nm
- Third Harmonic: 343 nm
- Controlled Period Fabrication: 0.8–1.3 µm interference field (515 nm)
- Microfabrication Area: 160 x 160 mm
- Positioning Precision: 300 nm
- XY Table Speed: Up to 300 mm/s
- Sample Weight Capacity: Up to 3 kg
- Harmonic Options for Fabrication:
- Transient absoption measurements:
- Spectroscopy Pump Wavelength Range: 315–2600 nm
- Spectroscopy Probe Wavelength Range: 480–1100 nm
- Time Resolution: 16.67 fs
- Delay Line Length: 1.8 ns
- Absorption Detection Limit: 0.5 mOD
material characterization and analysis, holography and lithography, micro- and nanofabrication