Universal optical spectroscopy and laser microfabrications system
Universal optical spectroscopy and laser microfabrications system

Femtosecond laser, ultra fast laser, laser microfabrication, micromachining, ablation, laser drilling, laser marking, laser engraving, galvoscanner, second harmonic, third harmonic, direct ablation with interference field, holographic lithography, 515, 315, 1030, kinetic spectroscopy, pump-probe spectroscopy, differential absorption spectrometer, differential absorption, ultra fast spectroscopy

Field of Science:
Diagnostic and measurement technologies, New materials for high-tech, Technologies for sustainable development and energy
Technical specification:
Yb:KGW laser wavelength is 1030 nm, power 4W, pulse duration 290 fs, energy >0.2 mJ. Fabrication can be performed employing focused first harmonic (1030 nm) second harmonic (515 nm) or third harmonic (3436 nm) of the laser. Fabrication with controlled period (0.8-1.3 um) interference field of second harmonic (515 nm) is alse available in the system. Microfabrication can be performed in 160x160 mm area with 300 nm positioning precision. Speed of the XY tables is up to 300 mm/s, sample wight up to 3 kg. The pump wavelength range of the spectroscopic system is 315-2600 nm, the probe wavelength range is 480-1100 nm. Time resolution 16.67 fs, length of the delay line 1,8 ns, absorbtion detection limit 0.5 mOD
Usage area:
Material mikro-/nano- fabrication with focused beam and measurements of absorbtion kinetics.
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