Mask aligner and nanoimprint lithography
Description:
Mask aligner and nanoimprint lithography

Keywords:
UV light, exposure, photolithography, optical lithography, nanoimprint lithography,

Field of Science:
Diagnostic and measurement technologies, New materials for high-tech, Technologies for sustainable development and energy
Technical specification:
UV400: 350-450 nm; UV300: 280-350 nm; UV250: 240-260 nm. UV nanoimprint lithography, soft and hard contact, photomask size 102x102 and 127x127 mm.
Usage area:
Mask alignement, UV exposure, nanoimprint lithography
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