Applications of plasmochemical technologies: selective etching, etching anisotropy, surface layer`s elemental structure change, inhibitor formation and use, hidden layer formation
Description:
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Keywords:
selective etching, etching anisotropy, surface layer`s elemental structure change, inhibitor formation and use, hidden layer formation

Field of Science:
Diagnostic and measurement technologies
Ellipsometer L117 No.166-AK
Ion etching device
Diodic AD vacuum system
Dark field microscope with extras NIKON Eclipse LV100D
Thin films` deposition controller and monitor Inficon XTM/2
Raman spectroscopy system
Spectrophotometer CHEM4-UV-FIBER
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