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We provide electron beam lithography services for photo template production, micro and nano structure formation on conductive surfaces. We can create detailed structures from 100nm, adapted for laser, ultrasound and other advanced technologies.

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We design and develop digital and analog electronic circuits and printed circuit boards according to customer specifications. We develop systems with embedded computers, multilayer PCBs (up to 7 layers, 100 µm), and manufacture and assemble prototypes.

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Critical point drying is performed using a QUORUM K850WM system operating at pressures up to 90 bar with liquid CO₂. The method ensures drying of structurally sensitive samples without surface tension-induced deformations. The chamber diameter is 150 mm.

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Non-destructive optical/optoacoustic control research, system development are being carried out. Automatic image recognition algorithms are being developed, laser, ultrasound technologies are being applied,real-time metrological systems are being implemented for monitoring production line processes.

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We perform modeling and analysis of mechanical objects, studying the strength and movement of products, devices or equipment. We use 2D and 3D models, analytical and numerical methods to optimize structures and ensure their reliability and efficiency.

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We perform surface structure studies of micro and nano structures using AFM / SPM microscopes. Mechanical probe scanning provides nanometric surface information. The largest scan area is 110 × 110µm, vertical resolution is 0.34 nm, horizontal resolution is 1.4 nm.