RF reactive ion etching system
Description:
RF reactive ion etching system
RF reactive ion etching system
Keywords:
reactive ion etching, surface microfabrication
Field of Science:
Diagnostic and measurement technologies, New materials for high-tech, Technologies for sustainable development and energy
Diagnostic and measurement technologies, New materials for high-tech, Technologies for sustainable development and energy
Technical specification:
power 3kW, homogeneous etching area diamater 15 cm
power 3kW, homogeneous etching area diamater 15 cm
Usage area:
reactive ion etching, surface microfabrication
reactive ion etching, surface microfabrication