RIE/PECVD: Reactive ion etching and plasma enhanced chemical vapor deposition system - PlasmaTherm PK-2430
Description:
RF reactive ion etching system
Keywords:
reactive ion etching, surface microfabrication
Field of Science:
ICT technologies, inclusive and creative society, Health technologies, biotechnologies and safe food, New production processes, materials and energy efficiency
ICT technologies, inclusive and creative society, Health technologies, biotechnologies and safe food, New production processes, materials and energy efficiency
Technical specification:
power 3kW, homogeneous etching area diamater 15 cm
Short description:
thin film deposition and coating, micro- and nanofabrication
thin film deposition and coating, micro- and nanofabrication