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MBE: Molecular beam epitaxy system - KRATOS
Description: KRATOS molecular beam epitaxy system for GaAs with control. |
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XPS: X-Ray photoelectron spectroscopy and Auger electron spectroscopy system - KRATOS XSAM800
Description: Quantitative and qualitative surface analysis using X-Ray photoelectron spectroscopy and Auger electron spectroscopy |
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EBL: E-beam lithography tool - Raith e-Line Plus
Description: The Raith e-Line Plus is an advanced electron beam lithography system designed for high-precision nanofabrication and nanoscale patterning. It features a versatile platform with a high-resolution electron beam column, capable of achieving feature sizes down to the sub-10 nanometer range. The Raith e-Line Plus has a user-friendly interface and comprehensive software suite, facilitating efficient and accurate design-to-device workflows. The system is also capable of scanning electron microscopy (SEM) and surface chemical analysis (EDX) from Be (Z=4) to Am (95). The system is installed in a class ISO5 cleanroom. |
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XPS: Universal X-Ray photoelectron and ion scatering spectroscopy surface analysis system - ThermoFisher ESCALAB 250Xi
Description: Quantitative and qualitative surface analysis using X-Ray photoelectron spectroscopy, ion scattering spectroscopy, reflection electron energy loss spectroscopy, angle Resolved XPS (ARXPS) with Ar ion surface eching/cleaning possibility |
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