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Laser ellipsometer L115
Description: Laser ellipsometer L115

Keywords: Laser ellipsometer, thin films, thickness, refraction index

Field of Science: Diagnostic and measurement technologies, New materials for high-tech, Technologies for sustainable development and energy
Technical specification: Length of the light wave used is 632.8 nm. Thickness of films possible for analysis is 0.001 - 1 µm. Uncertainty of thickness measurements is ±(0.5 – 1) nm. Accuracy of the refractive index measurements ±0.01.
Usage area: Measurements of refractive index and thickness of the dielectric and semiconducting thin films, semitransparent thin metal films (< 50 nm), polymeric thin films (e.g. photo resist).
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