Laser ellipsometer L115
Description:
Laser ellipsometer L115
Laser ellipsometer L115
Keywords:
Laser ellipsometer, thin films, thickness, refraction index
Field of Science:
Diagnostic and measurement technologies, New materials for high-tech, Technologies for sustainable development and energy
Diagnostic and measurement technologies, New materials for high-tech, Technologies for sustainable development and energy
Technical specification:
Length of the light wave used is 632.8 nm. Thickness of films possible for analysis is 0.001 - 1 µm. Uncertainty of thickness measurements is ±(0.5 – 1) nm. Accuracy of the refractive index measurements ±0.01.
Length of the light wave used is 632.8 nm. Thickness of films possible for analysis is 0.001 - 1 µm. Uncertainty of thickness measurements is ±(0.5 – 1) nm. Accuracy of the refractive index measurements ±0.01.
Usage area:
Measurements of refractive index and thickness of the dielectric and semiconducting thin films, semitransparent thin metal films (< 50 nm), polymeric thin films (e.g. photo resist).
Measurements of refractive index and thickness of the dielectric and semiconducting thin films, semitransparent thin metal films (< 50 nm), polymeric thin films (e.g. photo resist).