Mask aligner and nanoimprint lithography
Description: Mask aligner and nanoimprint lithography

Keywords: UV light, exposure, photolithography, optical lithography, nanoimprint lithography,

Field of Science: Diagnostic and measurement technologies, New materials for high-tech, Technologies for sustainable development and energy
Technical specification: UV400: 350-450 nm; UV300: 280-350 nm; UV250: 240-260 nm. UV nanoimprint lithography, soft and hard contact, photomask size 102x102 and 127x127 mm.
Usage area: Mask alignement, UV exposure, nanoimprint lithography
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