The Raith e-Line Plus is an advanced electron beam lithography system designed for high-precision nanofabrication and nanoscale patterning. It features a versatile platform with a high-resolution electron beam column, capable of achieving feature sizes down to the sub-10 nanometer range. The Raith e-Line Plus has a user-friendly interface and comprehensive software suite, facilitating efficient and accurate design-to-device workflows. The system is also capable of scanning electron microscopy (SEM) and surface chemical analysis (EDX) from Be (Z=4) to Am (95).
The system is installed in a class ISO5 cleanroom.
Keywords:
imaging, microscopy, scanning electron microscopy (SEM), X-ray energy dispersion spectroscopy (EDX, EDS), nanofabrication, lithography, exposure, e-beam lithography (EBL)
Technologies for sustainable development and energy, Featured research equipment
- Beam energy: 20 eV – 30 keV
- Beam current: 5 pA – 1.5 nA
- Writing speed: 0.125 Hz – 20 MHz pixel frequency
- Stage travel range/sample size: 100 mm (4")
- Beam size: >1.6 nm @ 20 keV
- Stitching accuracy: >40 nm (mean+3σ)
holography and lithography, micro- and nanofabrication