Description:

A laser ellipsometer is a precision optical instrument used to measure the thickness and optical properties of thin films on surfaces. It employs polarized laser light, which reflects off the sample, and analyzes changes in the polarization state to determine parameters such as refractive index and film thickness. This non-destructive technique is widely used in materials science, semiconductor manufacturing, and surface chemistry for characterizing surfaces at the nanometer scale.

Description:

Transmittance, absorbance and luminescence measurements in UV-VIS spectral range. Liquids can be analyzed in the standard cuvette, hard transparent samples

Description:

3D printer - Alfawise W10

Description:

Laser marking system

Description:

The Nova II is a very versatile and sophisticated handheld laser power/energy meter.

• Large high definition LCD display
• Compatible with standard Ophir thermal, BeamTrack, pyroelectric & photodiode sensors
• Choice of digital or analog needle display
• Backlighting and rechargeable battery
• Soft keys and menu driven functions with on line help
• Non-volatile data storage up to 59,400 points

Description:

The device is capable of analyzing the optical constants (k(λ), n(λ)) and measuring the thickness of thin layers, both isotropic and anisotropic, on a wide range of substrates, whether transparent or opaque. It is suitable for examining non-transparent materials as well. Additionally, the system supports the evaluation of periodic structures (scatterometry) and can be used to monitor absorption kinetics in liquids.

Description:

The Raith e-Line Plus is an advanced electron beam lithography system designed for high-precision nanofabrication and nanoscale patterning. It features a versatile platform with a high-resolution electron beam column, capable of achieving feature sizes down to the sub-10 nanometer range. The Raith e-Line Plus has a user-friendly interface and comprehensive software suite, facilitating efficient and accurate design-to-device workflows. The system is also capable of scanning electron microscopy (SEM) and surface chemical analysis (EDX) from Be (Z=4) to Am (95).

The system is installed in a class ISO5 cleanroom.

Description:

The OAI Hybralign Series 204IR is a mask aligner system used for parallel exposure wafers and wafer chips through a photomask to define microsctructures in UV sensitive resists. It features near-UV and deep-UV operating modes, an IR backside alignment system, and a UV nanoimprint add-on.

The system is installed in a class ISO5 cleanroom.

Description:

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Description:

ICP RIE system PlasmaTherm Apex SLR is used for the reactive ion etching of a variety of materials, most commonly Si/SiO2. It is equipped with fluorine-based gases and a cryo-cooled electrode, which enabled deep reactive ion etching (DRIE) of silicon. ICP RIE systems have two independent RF power supplies: one controls capacitive coupled plasma and the resulting self-bias, whereas the other supplies power to an antenna coil, inducing an inductively coupled plasma. This type of setup decouples the plasma density control (ICP) from the ion energy (CCP), allowing to achieve much higher etch rates without sacrificing selectivity. 

The system is installed in a class ISO5 cleanroom.