Description:

The Raith e-Line Plus is an advanced electron beam lithography system designed for high-precision nanofabrication and nanoscale patterning. It features a versatile platform with a high-resolution electron beam column, capable of achieving feature sizes down to the sub-10 nanometer range. The Raith e-Line Plus has a user-friendly interface and comprehensive software suite, facilitating efficient and accurate design-to-device workflows. The system is also capable of scanning electron microscopy (SEM) and surface chemical analysis (EDX) from Be (Z=4) to Am (95).

The system is installed in a class ISO5 cleanroom.

Description:

The JPK NanoWizard 3 scanning probe microscopy system is used for measuring surface topography and the mechanical, electrical, and magnetic properties of materials in both air and fluids. It is suitable for solids, polymers, biological samples, and molecular characterization, as well as for nanomanipulation and nanolithography. This system supports the development and research of advanced new materials and thin films, and it aids in the control of technological processes at the nanoscale.

The system is installed in a class ISO5 cleanroom.

Description:
High-speed signal analysis and diagnostics using digital storage oscilloscopes. It provides precise waveform capture, mixed-signal analysis, advanced triggering, and comprehensive measurement tools.

Description:
The double beam UV-visible/NIR spectrophotometer is designed for routine and research measurements. Halogen and deuterium lamps cover a wavelength range of 190-2700 nm. A PMT detector is used for the UV to the visible region, and a Peltier-cooled PbS detector for the NIR region detection. Spectrophotometer is operated using Spectra Manager™ Suite software. Spectrophotometer comes with a 60 mm diameter integrating sphere that can be used to measure either the diffuse transmittance or reflectance of liquid, solid, or powder samples. The integrating sphere includes a Spectralon reference tile and a specular reflectance exclusion sample holder. A film holder accessory can be used to measure the transmittance of a film-like sample when the incident angle of the light beam is varied. This incident angle can be set in 1º increments with a rotation range of ±90º.

Description:
Stylus profilometer used for high-precision surface metrology. It mechanically scans a fine stylus across a sample’s surface to measure surface topography and quantify features such as step heights, roughness, and film thickness with sub-nanometer accuracy. By taking many parallel measurements, a two-dimensional image of the surface topography can be acquired.

Description:
The Dynamic Light Scattering device is a high-end analytical instrument for characterizing nanoparticles and molecules in liquid samples. It uses combined Dynamic Light Scattering (DLS) and Electrophoretic Light Scattering (ELS) to measure particle/molecular size, zeta potential (particle charge/stability), and particle concentration. The system includes advanced optics like Non-Invasive Back Scatter (NIBS) and Multi-Angle Dynamic Light Scattering (MADLS) for high sensitivity, broad concentration range, and improved size distribution resolution. It operates with low sample volumes (as little as ~3 µL) and is controlled via user-friendly ZS Xplorer software for quick, reliable analysis.

Description:
The device can analyze multiple gas components simultaneously. The gas to be analyzed passes through a capillary to the mass spectrometer, which operates in a vacuum. The mass spectrometer ionizes a portion of the gas, and both separates and detects the different gas components based on their different mass/charge ratio. The gas inlet systems reduce the pressure of the gas to be analyzed from 1000 hPa to the operating pressure of the mass spectrometer.