Holography, lithography and laser ablation of micro-/nanostructures
Description:
This service provides comprehensive micro- and nanofabrication capabilities utilizing optical and electron beam technologies. The facility centers on the "Raith e-Line Plus" system for high-resolution electron beam lithography (EBL), enabling precise patterning required for nanophotonics and advanced electronics research. Periodic structures and diffractive optical elements (DOEs) are generated via Lloyd’s mirror configurations and dot-matrix holographic systems. The OAI "Hybralign 204IR" facilitates mask alignment and nanoimprint lithography (NIL), supporting both UV replication and thermal embossing processes. Additionally, CW and femtosecond laser systems offer capabilities for laser micro-machining. These tools collectively support the development of photonic crystals, security holograms, and functionalized surfaces for scientific and industrial applications.
This service provides comprehensive micro- and nanofabrication capabilities utilizing optical and electron beam technologies. The facility centers on the "Raith e-Line Plus" system for high-resolution electron beam lithography (EBL), enabling precise patterning required for nanophotonics and advanced electronics research. Periodic structures and diffractive optical elements (DOEs) are generated via Lloyd’s mirror configurations and dot-matrix holographic systems. The OAI "Hybralign 204IR" facilitates mask alignment and nanoimprint lithography (NIL), supporting both UV replication and thermal embossing processes. Additionally, CW and femtosecond laser systems offer capabilities for laser micro-machining. These tools collectively support the development of photonic crystals, security holograms, and functionalized surfaces for scientific and industrial applications.
Keywords:
null
Field of Science:
New production processes, materials and energy efficiency
New production processes, materials and energy efficiency
Lloyd's mirror holographic lithography setup
UV laser - CrystaLaser
Dot-matrix holographic lithography system
Universal optical spectroscopy and laser microfabrication system
EBL: E-beam lithography tool - Raith e-Line Plus
Mask aligner and nanoimprint lithography tool - OAI Hybralign 204IR