Description:
This service provides a comprehensive suite of techniques for synthesizing functional coatings and semiconductor structures. Utilizing Molecular Beam Epitaxy (MBE), the facility supports the growth of high-precision crystalline layers, while magnetron sputtering and vacuum evaporation systems facilitate controlled metal and dielectric deposition. Capabilities extend to diamond and Diamond-Like Carbon (DLC) synthesis via Microwave Plasma CVD (MPCVD) and ion beam synthesis methods. The infrastructure includes Plasma-Enhanced Chemical Vapor Deposition (PECVD) and wet-processing tools for organic layer formation, such as spin-coating units and Langmuir-Blodgett troughs. Complementary electroplating and Reactive Ion Etching (RIE) systems enable complex surface modification suitable for microelectronics and photonics applications.

Field of Science:
New production processes, materials and energy efficiency