Integrated Micro- and Nanofabrication
Description:
This service provides a comprehensive suite of micro- and nanofabrication capabilities, covering the workflow from pattern generation to structural replication. The facility utilizes electron beam lithography (EBL) for high-resolution direct writing and holographic lithography for creating periodic optical structures. These patterns are transferred into substrates via inductive coupled plasma (ICP) and reactive ion etching (RIE/IBE) techniques, ensuring high-aspect-ratio capabilities. Thin film deposition is achieved through magnetron sputtering, thermal evaporation, and PECVD methods. distinct advantage of this service is the capability for structural replication using thermal and UV nanoimprint lithography (NIL), including roll-to-roll (R2R) processing equipment designed for scaling manufacturing on flexible substrates.
This service provides a comprehensive suite of micro- and nanofabrication capabilities, covering the workflow from pattern generation to structural replication. The facility utilizes electron beam lithography (EBL) for high-resolution direct writing and holographic lithography for creating periodic optical structures. These patterns are transferred into substrates via inductive coupled plasma (ICP) and reactive ion etching (RIE/IBE) techniques, ensuring high-aspect-ratio capabilities. Thin film deposition is achieved through magnetron sputtering, thermal evaporation, and PECVD methods. distinct advantage of this service is the capability for structural replication using thermal and UV nanoimprint lithography (NIL), including roll-to-roll (R2R) processing equipment designed for scaling manufacturing on flexible substrates.
Keywords:
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Field of Science:
New production processes, materials and energy efficiency
New production processes, materials and energy efficiency
Lloyd's mirror holographic lithography setup
Galvanoplasty system
IBE: Ion beam etching system - USI-IONIC
RIE/PECVD: Reactive ion etching and plasma enhanced chemical vapor deposition system - PlasmaTherm PK-2430
Dot-matrix holographic lithography system
Roll-to-roll device for application of an adhesion layer - MSM-1
Thermal microimprint device
E-beam evaporator - YBH-71D3
Roll-to-roll thermal microimprint device
Universal optical spectroscopy and laser microfabrication system
Laser marking system - Reaying RY-F30
Spin coater and hotplate - SPS Polos 200
EBL: E-beam lithography tool - Raith e-Line Plus
Mask aligner and nanoimprint lithography tool - OAI Hybralign 204IR
CAPA: Capillary force-assisted nanoparticle assembly system
Magnetron sputtering tool - LH A700
Thermal evaporator - CUBIVAP
ICP RIE: Inductively coupled plasma reactive ion etching system - PlasmaTherm Apex SLR
Vinyl cutter - Roland GS-24