MMI

Microscopy and surface analysis
Description:
This facility provides comprehensive imaging capabilities ranging from optical inspection to nanoscale surface analysis. The core infrastructure includes a Field Emission Gun Scanning Electron Microscope (FEI Quanta 200 FEG) for high-resolution morphological studies of diverse materials. For surface topography and roughness quantification at the atomic scale, the service utilizes Atomic Force Microscopes (AFM), specifically the JPK NanoWizard 3 and NT-206 systems. Complementing these high-resolution techniques are specialized optical instruments, such as the Nikon Eclipse LV150N for metallography and OPTIKA systems for fluorescence imaging. This equipment suite supports structural characterization across biological and materials science domains.

Keywords:
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Field of Science:
New production processes, materials and energy efficiency
EDS: X-Ray energy dispersion spectrometer - Bruker Quantax
Optical microscope (analyzer) - Nikon
Optical
AFM: Atomic force microscope - NT-206
EBL: E-beam lithography tool - Raith e-Line Plus
Optical microscope - Nikon Eclipse LV150N
SEM: Scanning electron microscope - FEI Quanta 200 FEG
AFM: Scanning probe microscopy system - JPK NanoWizard 3
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