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Metal, dielectric, semiconductor thin films: deposition by vacuum, plasma and ion assisted methods and investigations
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transient absorbtion measurement
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Semiconductor surface passivation
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Analysis of optical properties
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Analysis of materials with Raman spectroscopy
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Device for roughness measurement of mechanical surfaces
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Formation and investigations of Schottky and ohmic contacts
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Deposition and investigations of the antireflective films
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Investigations of piezoresistive properties
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Laser interference lithography (LIL), hidden image holograms, 2D-3D holograms, rainbow holograms
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Investigations of electrical properties
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Device for replication of holograms
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Ni electroplating
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scanning electron microscopy
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Investigation of microhardness and other micromechanical properties
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Characterization of molecules and mixtures
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ICP RIE: Micro- and nanofabrication by reactive ion etching
Description: Reactive ion etching is performed using an inductively coupled plasma reactive ion etching tool PlasmaTherm Apex SLR (up to 6"). |
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Testing of fuel cell components ant other dielectric materials using imedance analyzer
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Laser ellipsometry
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Optical microscopy
Description: The optical microscopy service offers imaging techniques for comprehensive morphological material surface characterization, including bright field, dark field, differential interference contrast (DIC), and fluorescence regimes. Both epi-illumination and transmission modes are available, ensuring versatility in sample visualization and analysis. Fluorescence microscopy enables the detection and study of specific fluorescent markers. For experiments requiring precise thermal control, a temperature-controlled sample stage is available, allowing for the observation of dynamic processes under varying conditions. |
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Innovative materials and structures research in physical and chemical materials analysis
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Research and development of microsystems
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Diamond like carbon: synthesis and investigations
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Spin coating
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Langmuir-Blodgett technique
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AFM: Atomic force microscopy
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EBL: E-beam lithography
Description: E-beam lithography is a sophisticated technique used to create extremely fine patterns on substrates by directing a focused beam of electrons onto a resist-coated surface. This technique allows for the precise control of feature sizes down to the nanometer scale, making it essential for fabricating advanced semiconductor devices and nanoscale structures. E-beam lithography is highly valued for its ability to produce custom and complex patterns with high resolution. |
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Laser microfabrication
Description: Femtosecond laser micro- and nanofabrication system FemtoLab uses Yb:KGW laser Pharos, emitting 1030 nm, <4W, >270 fs pulses. Laser ablation can be performed using the fundamental wavelength, or higher harmonics (2H 515 nm, 3H 343 nm). Three ablation modes are available:
The system is controlled using SCA software, which allows to define the structure using command lines, import as a raster image, or any vector graphics format. Both focused beam and interference field ablation can be performed on <3 mm thick, <10x10 cm2 area objects. Ablation using a galvoscanner can be performed on 1-2 cm thick, <7x7 cm2 area objects. Curved objects (rods) are held by a rotating horizontal mount, inner diameter 2-4 cm, outer diameter 0-2 cm.
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Cleanroom
Description: Cleanrooms are closed spaces with precise control of temperature, humidity, pressure, and the concentration of airborne particles. ISO 14644-1 standard describes 9 cleanroom classes based on the particle concetration. The cleanroom in "Santaka" valley is class ISO5, which means that there are <3520 particles of size >0,5 um per 1 m3 of air inside it. Standards also describe the rules for tool use, personnel protective garments and cleaning procedures to ensure the control of all the relevant ambient conditions. Such strict requirements result in a much higher device yield, especially those with functional elements on the order of micrometers or even nanometers. Access to cleanroom requires passing a cleanroom introduction and chemical safety courses, as well as relevant tool training. |
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