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Quantitative and qualitative surface analysis  using X-Ray photoelectron spectroscopy, ion scattering spectroscopy,  reflection electron energy loss spectroscopy, angle Resolved XPS (ARXPS) with Ar ion surface eching/cleaning possibility

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KRATOS molecular beam epitaxy system for GaAs with control.

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Quantitative and qualitative surface analysis  using X-Ray photoelectron spectroscopy and Auger electron spectroscopy  

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Qualitative and quantitative analysis of chemical compounds; Ab initio-crystal structure of chemical compounds to identify and clarify; Material microstructure analysis (crystallite sizes, micro-stress, to determine the degree of crystallinity); X-ray diffraction measurements at a sliding angle of the focused (GID); Micro-Diffraction measurements; Small reflectometry and high resolution

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Scanning electron microscope

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The Raith e-Line Plus is an advanced electron beam lithography system designed for high-precision nanofabrication and nanoscale patterning. It features a versatile platform with a high-resolution electron beam column, capable of achieving feature sizes down to the sub-10 nanometer range. The Raith e-Line Plus has a user-friendly interface and comprehensive software suite, facilitating efficient and accurate design-to-device workflows. The system is also capable of scanning electron microscopy (SEM) and surface chemical analysis (EDX) from Be (Z=4) to Am (95).

The system is installed in a class ISO5 cleanroom.

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microwave plasma enhanced chemical vapor deposition system

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Characterization of molecules and mixtures, vibrational spectra identification. May be performed thin films, powders, liquid state materials research

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solar spectra simulator for measurement of photovoltaic properties

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ion etching system

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RF reactive ion etching system

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diamond like carbon ion beam synthesis system

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System is installed in a class ISO5 cleanroom.

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UV laser

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Dot-matrix hologram origination system

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Device for multiplication of optical security marks MSM-1. Fabrication of optical document security intellectual property measures with micro-diffractive elements. The adhesive layer formation on silicone paper and multilayer polymeric film. 

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investigations of electrical properties of dielectric films, testing of fuel cells

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picoammeter / bias source

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dynamic microhardness meter

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Formation of micro-relief on polymer surface

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vacuum evaporation unit

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Fabrication of optical document security intellectual property measures with micro-diffractive elements.

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Device for roughness measurement of mechanical surfaces

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Reflection, transmission, absorption measurements in UV-VIS spectral range. Applied in refractive index kinetics measurement stand

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Langmuir-Blodgett trough and control system. Langmuir-Blodgett trough is used to deposit single or multiple monolayers on a solid substrate.

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A laser ellipsometer is a precision optical instrument used to measure the thickness and optical properties of thin films on surfaces. It employs polarized laser light, which reflects off the sample, and analyzes changes in the polarization state to determine parameters such as refractive index and film thickness. This non-destructive technique is widely used in materials science, semiconductor manufacturing, and surface chemistry for characterizing surfaces at the nanometer scale.

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Universal optical spectroscopy and laser microfabrications system

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Used for mixing polydimethysiloxane (PDMS) monomer and its curing agent at a ratio 10:1. Single-use static mixers are used to mix and dispense the components.

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3D printer - Alfawise W10

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Laser marking system

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Induction heater for metal melting

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Salt (fog) spray corrosion test chamber can be used for all kinds of material surface treatment, including coating, electroplating, organic and inorganic coating, anodizing, rust proof oil and preservative treatment test of its corrosion resistance, so as to establish the quality of the products.

Description:

The Nova II is a very versatile and sophisticated handheld laser power/energy meter.

• Large high definition LCD display
• Compatible with standard Ophir thermal, BeamTrack, pyroelectric & photodiode sensors
• Choice of digital or analog needle display
• Backlighting and rechargeable battery
• Soft keys and menu driven functions with on line help
• Non-volatile data storage up to 59,400 points

Description:

Device is feasible to analyse optical constants (k(λ), n(λ)), thickness of thin isotropic and anisotropic transparent and non-transparent layers on isotropic and anisotropic transparent and non-transparent substrates. It can be also used for evaluations of periodical structures (scatterometry) and absorption kinetics in liquids.

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Gloss meter Elcometer 480, 3 angles. Measures and records gloss, reflection and haze measurements on a variety of materials including paint, plastic, ceramic or metal.

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The SPS Polos 200 is a high-performance spin-coater designed for application of thin films onto substrates. It features customizable spin speeds and acceleration profiles, allows defining multiple process steps. The system accommodates a variety of substrates and coating materials, but is mostly used for spin coating resists for photolithography or electron beam lithography.

The system is installed in a class ISO5 cleanroom.

Description:

KW-4A is a compact and easy-to-use spin coater for precise and uniform deposition of thin films and coatings. Its rugged, vibration-free and portable design makes it a versatile tool. A two-stage spin process allows dispensing at low speed and homogenizing the coating at high speed. The KW-4A spin coater can be used to deposit metal oxide thin films, polymer coatings and metal organic thin films. This product features a Teflon-coated stainless steel coating bowl. 

Description:

Vacuum evaporation tool CUBIVAP is used for deposition of Ag thin films by resistive evaporation.

The system is installed in a class ISO5 cleanroom.

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Optical microscope - Nikon Eclipse LV150N is a metallurgical microscope used for surface imaging. It operates in epi-illumination regime and has both bright field and dark field modes. Output can be switched between 10x oculars and a CCD camera. Polarizers are available for polarization contrast imaging.

The system is installed in a class ISO5 cleanroom.

Description:

ICP RIE system PlasmaTherm Apex SLR is used for the reactive ion etching of a variety of materials, most commonly Si/SiO2. It is equipped with fluorine-based gases and a cryo-cooled electrode, which enabled deep reactive ion etching (DRIE) of silicon. ICP RIE systems have two independent RF power supplies: one controls capacitive coupled plasma and the resulting self-bias, whereas the other supplies power to an antenna coil, inducing an inductively coupled plasma. This type of setup decouples the plasma density control (ICP) from the ion energy (CCP), allowing to achieve much higher etch rates without sacrificing selectivity. 

The system is installed in a class ISO5 cleanroom.

Description:

The OAI Hybralign Series 204IR is a mask aligner system used for parallel exposure wafers and wafer chips through a photomask to define microsctructures in UV sensitive resists. It features near-UV and deep-UV operating modes, an IR backside alignment system, and a UV nanoimprint add-on.

The system is installed in a class ISO5 cleanroom.

Description:

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Description:

The WinCamD-LCM is a laser beam profiling device from DataRay designed for precise measurement of laser beam diameter, profile, and intensity distribution. It features a high dynamic range CMOS sensor, capable of accurately measuring beams across a wide range from UV to IR. The WinCamD-LCM also comes with intuitive software that makes it easy to analyze and visualize laser beam properties.

Description:

Setup with the confocal micro-Raman optical system is devoted for Raman scattering spectra registration. Raman scattering spectroscopy can be used for the analysis of bulk materials, thin layers, powder and solutions. Unknown materials can be identified using the 8000 spectra containing spectral library. Measurements of various carbon allotropes (diamond-type carbon, graphene, graphene oxide), organic and inorganic materials, surface-enhanced Raman scattering measurements using silver or gold nanoparticles are performed.

Description:

The JPK NanoWizard 3 scanning probe microscopy system is used for measuring surface topography and the mechanical, electrical, and magnetic properties of materials in both air and fluids. It is suitable for solids, polymers, biological samples, and molecular characterization, as well as for nanomanipulation and nanolithography. This system supports the development and research of advanced new materials and thin films, and it aids in the control of technological processes at the nanoscale.

The system is installed in a class ISO5 cleanroom.

Description:

Reflection, transmission, absorption measurements in UV-VIS-NIR spectral range.  Liquids can be analyzed in the standard cell, hard transparent (measured transmission and the absorption) or vague (measured reflection) samples

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Atomic force microscope NT-206

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Measurement of linear dimensions of the transparent structures in manual and automatic modes with high fidelity

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Energy dispersive X-Ray analysis, Determination of chemical composition , elemnt mapping

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Fabrication of Ni replica matrix with submicron (nanometric) precision and high diffraction efficiency of the final product.

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Lloyd`s mirror holographic lithography setup.