microwave plasma enhanced chemical vapor deposition system
Description:
microwave plasma enhanced chemical vapor deposition system
microwave plasma enhanced chemical vapor deposition system
Keywords:
thin film and coating deposition
Field of Science:
Diagnostic and measurement technologies, New materials for high-tech, Technologies for sustainable development and energy
Diagnostic and measurement technologies, New materials for high-tech, Technologies for sustainable development and energy
Technical specification:
plasma source diameter 6", power 6 kW frequeency 2.45 GHz homogeneous deposition area diameter 5 cm
plasma source diameter 6", power 6 kW frequeency 2.45 GHz homogeneous deposition area diameter 5 cm
Usage area:
thin film and coating deposition
thin film and coating deposition