MMI
ICP deep reactive etching system,
Description:
ICP deep reactive etching system,

Keywords:
deep reactive ion etching, bulkmicrofabrication

Field of Science:
Diagnostic and measurement technologies, New materials for high-tech, Technologies for sustainable development and energy
Technical specification:
Homogeneous etching area diameter 15 cm
Usage area:
deep reactive ion etching, bulkmicrofabrication
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