MMI
IBE: Ion beam etching system - USI-IONIC
Description:

ion etching system

Keywords:
ion beam etching, surface microfabrication

Field of Science:
ICT technologies, inclusive and creative society, Health technologies, biotechnologies and safe food, New production processes, materials and energy efficiency
Technical specification:

homogeneous etching area diamater 8 cm

Short description:
micro- and nanofabrication
Request form