The SPS Polos 200 is a high-performance spin-coater designed for application of thin films onto substrates. It features customizable spin speeds and acceleration profiles, allows defining multiple process steps. The system accommodates a variety of substrates and coating materials, but is mostly used for spin coating resists for photolithography or electron beam lithography.
The system is installed in a class ISO5 cleanroom.
Keywords:
nanofabrication, thin film, spin coating, lithography
Diagnostic and measurement technologies, New materials for high-tech, Technologies for sustainable development and energy
- Spin speed: <10000 RPM
- Duration: 1-999 s
- Sample size: <150 mm (6")
- Hotplate temperature range: 50ºC - 250ºC
- Hotplate area: 230x230 mm2
thin film deposition and coating, micro- and nanofabrication