transient absorbtion measurement
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Laser interference lithography (LIL), hidden image holograms, 2D-3D holograms, rainbow holograms
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Semiconductor surface passivation
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Analysis of optical properties
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Analysis of materials with Raman spectroscopy
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Device for roughness measurement of mechanical surfaces
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Formation and investigations of Schottky and ohmic contacts
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Deposition and investigations of the antireflective films
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Investigations of piezoresistive properties
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Metal, dielectric, semiconductor thin films: deposition by vacuum, plasma and ion assisted methods and investigations
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Testing of fuel cell components ant other dielectric materials using imedance analyzer
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Optical microscopy
Description: The optical microscopy service offers imaging techniques for comprehensive morphological material surface characterization, including bright field, dark field, differential interference contrast (DIC), and fluorescence regimes. Both epi-illumination and transmission modes are available, ensuring versatility in sample visualization and analysis. Fluorescence microscopy enables the detection and study of specific fluorescent markers. For experiments requiring precise thermal control, a temperature-controlled sample stage is available, allowing for the observation of dynamic processes under varying conditions. |
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Research and development of microsystems
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AFM: Atomic force microscopy
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Laser microfabrication
Description: Femtosecond laser micro- and nanofabrication system FemtoLab uses Yb:KGW laser Pharos, emitting 1030 nm, <4W, >270 fs pulses. Laser ablation can be performed using the fundamental wavelength, or higher harmonics (2H 515 nm, 3H 343 nm). Three ablation modes are available:
The system is controlled using SCA software, which allows to define the structure using command lines, import as a raster image, or any vector graphics format. Both focused beam and interference field ablation can be performed on <3 mm thick, <10x10 cm2 area objects. Ablation using a galvoscanner can be performed on 1-2 cm thick, <7x7 cm2 area objects. Curved objects (rods) are held by a rotating horizontal mount, inner diameter 2-4 cm, outer diameter 0-2 cm.
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Optical lithography
Description: Optical lithography is a microtechnology process to structure thin films. The designed layout is exposed through a photomask on a UV-sensitive layer of photoresist coated on a wafer or a wafer chip. Depending on the photoresist polarity, exposed areas will either wash out or remain after a development step. Optical lithography allows to form >1 μm microstructures. |
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Characterization of molecules and mixtures
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Laser ellipsometry
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Innovative materials and structures research in physical and chemical materials analysis
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Diamond like carbon: synthesis and investigations
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Spin coating
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Langmuir-Blodgett technique
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Investigations of electrical properties
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Device for replication of holograms
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Ni electroplating
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scanning electron microscopy
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Investigation of microhardness and other micromechanical properties
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