SEM: Scanning electron microscope - FEI Quanta 200 FEG
Description: This scanning electron microscope (SEM) offers versatile imaging capabilities across various vacuum regimes, enabling high-resolution imaging of both conductive and non-conductive materials. Its ability to operate under different pressures, including high and low vacuum, as well as Environmental SEM (ESEM) conditions, makes it suitable for analyzing a wide range of samples with exceptional precision. |
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XPS: X-Ray photoelectron spectroscopy and Auger electron spectroscopy system - KRATOS XSAM800
Description: Quantitative and qualitative surface analysis using X-Ray photoelectron spectroscopy and Auger electron spectroscopy |
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XPS: Universal X-Ray photoelectron and ion scatering spectroscopy surface analysis system - ThermoFisher ESCALAB 250Xi
Description: The ThermoFisher ESCALAB 250Xi is an advanced surface analysis tool designed for both qualitative and quantitative investigations of material surfaces. Utilizing X-ray photoelectron spectroscopy (XPS), ion scattering spectroscopy (ISS), and reflection electron energy loss spectroscopy (REELS), this system provides comprehensive insight into surface chemistry and electronic structure. The addition of angle-resolved XPS (ARXPS) allows for depth profiling, while an Ar ion beam enables precise surface cleaning and etching. |
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XRD: X-ray diffractometer - Bruker D8 Discover
Description: The X-ray diffraction (XRD) device is designed for both qualitative and quantitative analysis of chemical compounds, offering precise insights into material composition. It enables ab initio crystal structure determination, helping to identify and clarify the atomic arrangement of compounds. The system is also adept at analyzing material microstructures, including crystallite sizes, micro-stress, and the degree of crystallinity. Advanced measurement capabilities include grazing incidence diffraction (GID) for surface analysis, micro-diffraction for localized studies, as well as small-angle reflectometry and high-resolution measurements for detailed material characterization. This versatility makes it an essential tool for research in materials science, chemistry, and solid-state physics. |
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MBE: Molecular beam epitaxy system - KRATOS
Description: KRATOS molecular beam epitaxy system for GaAs with control. |
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AFM: Atomic force microscope - NT-206
Description: Atomic force microscope NT-206 |
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Lloyd's mirror holographic lithography setup
Description: Lloyd`s mirror holographic lithography setup. |
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FTIR: Fourier transform infrared spectrometer - Bruker Vertex 70
Description: Characterization of molecules and mixtures, vibrational spectra identification. May be performed thin films, powders, liquid state materials research |
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Solar spectrum simulator
Description: solar spectra simulator for measurement of photovoltaic properties |
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IBE: Ion beam etching system - USI-IONIC
Description: ion etching system |
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RIE/PECVD: Reactive ion etching and plasma enhanced chemical vapor deposition system - PlasmaTherm PK-2430
Description: RF reactive ion etching system |
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Diamond like carbon ion beam synthesis system
Description: diamond like carbon ion beam synthesis system |
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UV laser - CrystaLaser
Description: UV laser |
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Dot-matrix holographic lithography system
Description: Dot-matrix hologram origination system |
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Roll-to-roll device for application of an adhesion layer - MSM-1
Description: Device for multiplication of optical security marks MSM-1. Fabrication of optical document security intellectual property measures with micro-diffractive elements. The adhesive layer formation on silicone paper and multilayer polymeric film. |
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Impedance analyzer - Novocontrol Alpha-AK
Description: investigations of electrical properties of dielectric films, testing of fuel cells |
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Picoammeter / DC source - Keithley 6487
Description: picoammeter / bias source |
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Dynamic microhardness meter - Fischerscope HM 2000S
Description: dynamic microhardness meter |
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Thermal microimprint device
Description: Formation of micro-relief on polymer surface |
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E-beam evaporator - YBH-71D3
Description: vacuum evaporation unit |
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Roll-to-roll thermal microimprint device
Description: Fabrication of optical document security intellectual property measures with micro-diffractive elements. |
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Fiber optic spectrometer & light source - Avantes AvaSpec-2048 & AvaLight-DHc
Description: Reflection, transmission, absorption measurements in UV-VIS spectral range. Applied in refractive index kinetics measurement stand |
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Surface roughness measurement device - Time TR200
Description: Device for roughness measurement of mechanical surfaces |
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Langmuir-Blodgett trough
Description: Langmuir-Blodgett trough and control system. Langmuir-Blodgett trough is used to deposit single or multiple monolayers on a solid substrate. |
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Laser ellipsometer - Gaertner L115
Description: A laser ellipsometer is a precision optical instrument used to measure the thickness and optical properties of thin films on surfaces. It employs polarized laser light, which reflects off the sample, and analyzes changes in the polarization state to determine parameters such as refractive index and film thickness. This non-destructive technique is widely used in materials science, semiconductor manufacturing, and surface chemistry for characterizing surfaces at the nanometer scale. |
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Universal optical spectroscopy and laser microfabrication system
Description: The Universal Optical Spectroscopy and Laser Microfabrication System combines advanced laser microfabrication capabilities with precise optical spectroscopy, making it suitable for a wide range of applications. It uses an ultrafast Yb:KGW laser to enable precise material processing at various wavelengths, including its harmonics, and can handle large sample areas with high positioning accuracy. Additionally, the system offers exceptional control over fabrication patterns and supports detailed spectroscopic analysis across a broad spectral range, making it ideal for both cutting-edge research and industrial microfabrication tasks. |
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Two component mixer - Dopag Micro Mix E
Description: Used for mixing polydimethysiloxane (PDMS) monomer and its curing agent at a ratio 10:1. Single-use static mixers are used to mix and dispense the components. |
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Fiber optic spectrometer - CMA 012
Description: Transmittance, absorbance and luminescence measurements in UV-VIS spectral range. Liquids can be analyzed in the standard cuvette, hard transparent samples |
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Salt spray corrosion test chamber - 60A
Description: Salt (fog) spray corrosion test chamber can be used for all kinds of material surface treatment, including coating, electroplating, organic and inorganic coating, anodizing, rust proof oil and preservative treatment test of its corrosion resistance, so as to establish the quality of the products. |
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Four-point probe measurement system
Description: Four-point probe measurement system For measurement of sheet resistance and electrical conductivity |
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Laser power meter - Ophir Nova II
Description: The Nova II is a very versatile and sophisticated handheld laser power/energy meter.
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Infrared thermometer - UNI-T UT302D+
Description: Infrared thermometer |
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Spectroscopic ellipsometer - Semilab GES5E
Description: The device is capable of analyzing the optical constants (k(λ), n(λ)) and measuring the thickness of thin layers, both isotropic and anisotropic, on a wide range of substrates, whether transparent or opaque. It is suitable for examining non-transparent materials as well. Additionally, the system supports the evaluation of periodic structures (scatterometry) and can be used to monitor absorption kinetics in liquids. |
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Glossmeter - Elcometer 480
Description: Gloss meter Elcometer 480, 3 angles. Measures and records gloss, reflection and haze measurements on a variety of materials including paint, plastic, ceramic or metal. |
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Spin coater and hotplate - SPS Polos 200
Description: The SPS Polos 200 is a high-performance spin-coater designed for application of thin films onto substrates. It features customizable spin speeds and acceleration profiles, allows defining multiple process steps. The system accommodates a variety of substrates and coating materials, but is mostly used for spin coating resists for photolithography or electron beam lithography. The system is installed in a class ISO5 cleanroom. |
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Spin coating system - Chemat KW-4A
Description: KW-4A is a compact and easy-to-use spin coater for precise and uniform deposition of thin films and coatings. Its rugged, vibration-free and portable design makes it a versatile tool. A two-stage spin process allows dispensing at low speed and homogenizing the coating at high speed. The KW-4A spin coater can be used to deposit metal oxide thin films, polymer coatings and metal organic thin films. This product features a Teflon-coated stainless steel coating bowl. |
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Drop shape analyzer - Kruss DSA25
Description: - |
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Beam profiler - DataRay WinCamD-LCM
Description: The WinCamD-LCM is a laser beam profiling device from DataRay designed for precise measurement of laser beam diameter, profile, and intensity distribution. It features a high dynamic range CMOS sensor, capable of accurately measuring beams across a wide range from UV to IR. The WinCamD-LCM also comes with intuitive software that makes it easy to analyze and visualize laser beam properties. |
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Raman scattering spectrometer - Renishaw inVia
Description: Setup with the confocal micro-Raman optical system is devoted for Raman scattering spectra registration. Raman scattering spectroscopy can be used for the analysis of bulk materials, thin layers, powder and solutions. Unknown materials can be identified using the 8000 spectra containing spectral library. Measurements of various carbon allotropes (diamond-type carbon, graphene, graphene oxide), organic and inorganic materials, surface-enhanced Raman scattering measurements using silver or gold nanoparticles are performed. |
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Magnetron sputtering tool - LH A700
Description: The Leybold-Heraeus A700 sputtering tool is a versatile system designed for high-quality thin film deposition using DC sputtering. The system supports deposition of a wide range of metals. Its rotatable substrate holder ensures uniform coatings. Automated gas flow control and in situ monitoring provides precise control over film thickness and composition. System is installed in a class ISO5 cleanroom. |
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Fiber optic spectrometer - Avantes AvaSpec-2048
Description: Reflection, transmission, absorption measurements in UV-VIS-NIR spectral range. Liquids can be analyzed in the standard cell, hard transparent (measured transmission and the absorption) or vague (measured reflection) samples |
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AFM: Scanning probe microscopy system - JPK NanoWizard 3
Description: The JPK NanoWizard 3 scanning probe microscopy system is used for measuring surface topography and the mechanical, electrical, and magnetic properties of materials in both air and fluids. It is suitable for solids, polymers, biological samples, and molecular characterization, as well as for nanomanipulation and nanolithography. This system supports the development and research of advanced new materials and thin films, and it aids in the control of technological processes at the nanoscale. The system is installed in a class ISO5 cleanroom. |
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Optical microscope (analyzer) - Nikon
Description: Measurement of linear dimensions of the transparent structures in manual and automatic modes with high fidelity |
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MPCVD: Microwave plasma enhanced chemical vapor deposition system - iplas Cyrannus I-6
Description: microwave plasma enhanced chemical vapor deposition system |
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EDS: X-Ray energy dispersion spectrometer - Bruker Quantax
Description: Energy dispersive X-Ray analysis, Determination of chemical composition , elemnt mapping |
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Galvanoplasty system
Description: Fabrication of Ni replica matrix with submicron (nanometric) precision and high diffraction efficiency of the final product. |
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