MMI

Metal, dielectric, semiconductor thin films: deposition by vacuum, plasma and ion assisted methods and investigations
Description:
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Keywords:
metal, dielectric, semiconductor, thin films, deposition by vacuum, plasma and ion assisted methods and investigations; structure, mechanical,electrical and optical properties

Field of Science:
Diagnostic and measurement technologies, New materials for high-tech, Technologies for sustainable development and energy
The fiber-optic spectrometer AvaSpec-2048
microwave plasma enhanced chemical vapor deposition system
Fourier transform infrared spectrometer
magnetron
vacuum evaporation unit
vacuum evaporation unit
RF reactive ion etching system
ion etching system
diamond like carbon ion beam synthesis system
Raman scattering spectrometer Renishaw in Via Spectrometer with accessories
dynamic microhardness meter
vacuum evaporation unit
ICP deep reactive etching system,
Universal surface analysis system for X-Ray photoelectron spectroscopy, ion scatering spectroscopy, reflection electron energy loss spectroscopy, and angle Resolved XPS (ARXPS)
Spectroscopic ellipsometer
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