Magnetron sputtering tool - LH A700
Description:
The Leybold-Heraeus A700 sputtering tool is a versatile system designed for high-quality thin film deposition using DC sputtering. The system supports deposition of a wide range of metals. Its rotatable substrate holder ensures uniform coatings. Automated gas flow control and in situ monitoring provides precise control over film thickness and composition.
System is installed in a class ISO5 cleanroom.
Keywords:
nanofabrication, thin film, vacuum deposition, magnetron sputtering
Field of Science:
Diagnostic and measurement technologies, New materials for high-tech, Technologies for sustainable development and energy
Diagnostic and measurement technologies, New materials for high-tech, Technologies for sustainable development and energy
Technical specification:
- Sputtering Process Type: DC sputtering
- Vacuum Range: High vacuum up to 1E-6 mbar
- Substrate Holder: Rotatable for uniform coating
- Target Materials: ...
- Deposition Rate: Adjustable, depending on material and process conditions
- Gas Flow Control: Automated MFC
- Film Thickness Control: In situ monitoring using quartz crystal microbalance
- Sample Size: Compatible with various substrate sizes
Usage area:
thin film deposition and coating, micro- and nanofabrication
thin film deposition and coating, micro- and nanofabrication