RIE/PECVD: Reactive ion etching and plasma enhanced chemical vapor deposition system - PlasmaTherm PK-2430
Description:
RF reactive ion etching system
Keywords:
reactive ion etching, surface microfabrication
Field of Science:
Diagnostic and measurement technologies, New materials for high-tech, Technologies for sustainable development and energy
Diagnostic and measurement technologies, New materials for high-tech, Technologies for sustainable development and energy
Technical specification:
power 3kW, homogeneous etching area diamater 15 cm
Usage area:
thin film deposition and coating, micro- and nanofabrication
thin film deposition and coating, micro- and nanofabrication