Description:

KRATOS molecular beam epitaxy system for GaAs with control.

Description:

Quantitative and qualitative surface analysis  using X-Ray photoelectron spectroscopy and Auger electron spectroscopy  

Description:

The Raith e-Line Plus is an advanced electron beam lithography system designed for high-precision nanofabrication and nanoscale patterning. It features a versatile platform with a high-resolution electron beam column, capable of achieving feature sizes down to the sub-10 nanometer range. The Raith e-Line Plus has a user-friendly interface and comprehensive software suite, facilitating efficient and accurate design-to-device workflows. The system is also capable of scanning electron microscopy (SEM) and surface chemical analysis (EDX) from Be (Z=4) to Am (95).

The system is installed in a class ISO5 cleanroom.

Description:

The ThermoFisher ESCALAB 250Xi is an advanced surface analysis tool designed for both qualitative and quantitative investigations of material surfaces. Utilizing X-ray photoelectron spectroscopy (XPS), ion scattering spectroscopy (ISS), and reflection electron energy loss spectroscopy (REELS), this system provides comprehensive insight into surface chemistry and electronic structure. The addition of angle-resolved XPS (ARXPS) allows for depth profiling, while an Ar ion beam enables precise surface cleaning and etching.