Description: material characterization and analysis
Description: material characterization and analysis, microscopy and imaging
Description: holography and lithography, micro- and nanofabrication
Description: material characterization and analysis
Description: thin film deposition and coating
Description: material characterization and analysis, microscopy and imaging
Description: thin film deposition and coating, micro- and nanofabrication
Description: thin film deposition and coating
Description: thin film deposition and coating, micro- and nanofabrication
Description: holography and lithography, micro- and nanofabrication
Description: micro- and nanofabrication
Description: electrical measurement and testing, material characterization and analysis
Description: material characterization and analysis
Description: thin film deposition and coating, micro- and nanofabrication
Description: material characterization and analysis
Description: material characterization and analysis
Description: material characterization and analysis, holography and lithography, micro- and nanofabrication
Description: holography and lithography, micro- and nanofabrication
Description: material characterization and analysis
Description: heat treatment and thermal processing
Description: material characterization and analysis
Description: thin film deposition and coating, micro- and nanofabrication
Description: holography and lithography, micro- and nanofabrication
Description: holography and lithography, micro- and nanofabrication
Description: micro- and nanofabrication
Description: material characterization and analysis
Description: material characterization and analysis
Description: electrical measurement and testing
Description: material characterization and analysis, microscopy and imaging
Description: thin film deposition and coating, micro- and nanofabrication
Description: thin film deposition and coating, micro- and nanofabrication
Description: micro- and nanofabrication
Description: material characterization and analysis
Description: material characterization and analysis, microscopy and imaging
Description: material characterization and analysis
Description: Measurement of electrical signals with digital osciloscope
Description: Intense light source with tunable wavelength and spectral bandwidth for optical measurements
Description: Spectral measurements of low intensity light
Description: Light spectrum analysis with high resolution
Description: Optical characterization of solutions or solid materials in the range of 190-2700 nm, samples can be studied in transmission and reflection modes
Description: Determination of surface roughness or step height by measuring with a profilometer stylus probe that is scanned across the line over surface.
Description: Evaluation of colloidal solution particle size using dynamic light scattering measurements. Measurement of particle Zeta potential.
Description: Quadrupole mass spectrometer with a vacuum system for gas analysis through a heated 2-meter-long stainless steel capillary.
Description: Material structure and surface analysis services are provided using X-ray Diffraction (XRD), X-ray Photoelectron Spectroscopy (XPS), and Energy Dispersive Spectroscopy (EDS). Capabilities include phase identification, chemical state determination, and elemental composition mapping.
Description: The service offers multi-modal imaging solutions, including Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM), and optical techniques. Capabilities include high-resolution morphological analysis, surface topography mapping, and fluorescence microscopy for material characterization.
Description: Services include the determination of material chemical composition and optical constants. The laboratory utilizes Raman and FTIR spectroscopy, multi-spectral ellipsometry, and UV-VIS-NIR fiber-optic spectrometry for the analysis of thin films and functional materials.
Description: We offer specialized services for the fabrication of micro- and nanostructures using electron beam and holographic lithography. Capabilities include dry etching, thin film deposition, and structural replication via thermal and UV nanoimprint technologies, including roll-to-roll processing.
Description: We offer capabilities for material homogenization, precision dispensing, and corrosion resistance testing. The service includes contactless degassing of viscous mixtures, solvent evaporation, and 2K system metering. Accelerated aging tests are performed in a salt spray chamber to assess coating dura
Description: We offer electrical characterization for materials and optical systems. The service encompasses low-current, resistivity, and impedance measurements, alongside laser beam profiling and power analysis. Controlled gas flow experiments and non-contact thermal testing are available for semiconductors an
Description: Comprehensive thin film deposition services covering PVD, CVD, MBE, and solution-based techniques. The facility enables the fabrication of semiconductor, metallic, diamond-like, and organic coatings designed for advanced research and device prototyping.
Description: The facility offers diverse patterning techniques, ranging from electron beam lithography to holographic recording and nanoimprinting. Available equipment supports the fabrication of high-resolution nanostructures, diffractive optics, and photonic devices using UV and laser-based methods.
Description: We provide testing services for surface microhardness, roughness, and wettability. The analysis encompasses Martens hardness determination, scratch resistance evaluation, and surface energy measurements. Testing is performed using specialized equipment suitable for diverse coatings and bulk material