Laboratory of Physical Technologies and Microtechnology
Description:
Laboratory work objectives: to acquire modern microtechnology, to obtain practice in use of technological equipment and measurement of formed microstructures electrophysical characteristics.
Laboratory work objectives: to acquire modern microtechnology, to obtain practice in use of technological equipment and measurement of formed microstructures electrophysical characteristics.
Keywords:
silicon, silicon dioxide, diffusion furnace, oxidation, photolithography, etching.
Field of Science:
Diagnostic and measurement technologies, New materials for high-tech
Diagnostic and measurement technologies, New materials for high-tech
Technical specification:
1. Cleaning and inspection of silicon wafer surface. 2. Study of silicon isothermal oxidation in diffusion furnace. 3. Study of silicon isochronous oxidation in diffusion furnace. 4. Formation of microstructures by means of optical contact lithography.
1. Cleaning and inspection of silicon wafer surface. 2. Study of silicon isothermal oxidation in diffusion furnace. 3. Study of silicon isochronous oxidation in diffusion furnace. 4. Formation of microstructures by means of optical contact lithography.
Usage area:
For students of Applied Physics bachelor study program and Materials and Nanotechnologies bachelor study program in Faculty of Mathematics and Natural Sciences.
For students of Applied Physics bachelor study program and Materials and Nanotechnologies bachelor study program in Faculty of Mathematics and Natural Sciences.